9 Institutskii per.,
Dolgoprudny, Moscow region

Technical program

Dear participants of ALD Russia 2015, the updated version of Technical Program is now available.

Invited speakers

  1. The origins of ML-ALD in the USSR-Russia: from V. B. Aleskovskiiיs “framework hypothesis” on the path to precise synthesis of solids, A.A. Malygin, St. Petersburg Technological University, Russia.
  2. Atomic Layer Etching Using Thermal Reactions:  ALD in Reverse, Steven M. George, University of Colorado at Boulder, USA.
  3. How conformal is conformal? Exploring the limits of ALD film conformality with VTT’s lateral microscopic test structure, Riikka Puurunen, VTT, Finland.
  4. The nature of electron and hole traps responsible for localization and charge transport in high-k dielectrics, V.A. Gritsenko, Rzhanov Institute of Semiconductor Physics SB RAS.
  5. Atomic layer deposition of Ge2Sb2Te5 thin films for phase change memory, Cheol Seong Hwang, Seoul National University, Korea.
  6. Atomic layer deposition for rare earth oxides and thermoelectric thin films, Giovanna Scarel, James Medison University, USA.
  7. Plasma-assisted ALD: status and prospects, Erwin Kessels, Eindhoven University of Technology, Netherlands.
  8. In-Situ Studies of ALD on 2D Materials, Robert M. Wallace, University of Texas at Dallas, USA.
  9. ALD nanolaminates for solar cell application, Ingo Dirnstorfer, Namlab, Germany.
  10. Atomic layer deposition of transition metal dichalcogenides, two-dimensional semiconductors, Annelies Delabie, IMEC, Belgium.
  11. Chemistry of platinum group metal compounds as precursors for Chemical Vapor Deposition, N.B. Morozova, A.V. Nikolaev Institute of Inorganic Chemistry, Russia.
  12. Ruthenium and Iridium thin deposition: summary and issues, V.Yu. Vasiliev, Novosibirsk state technical university and SibIS LLC, Russia.
  13. ALD of oxides for nanoelectronic devices:  status and perspectives, Sabina Spiga, CNR-IMM-MDM, Italy.
  14. Nucleation reactions during Atomic Layer Deposition, Gregory N. Parsons, North Carolina State University, USA.
  15. Gold Metal Films by Radical-Enhanced Atomic Layer Deposition, Sean Barry, Carleton University, Canada.
  16. The synthesis of two dimensional nanomaterials based on Atomic Layer Deposition, Hyungjun Kim, Yonsei University, Korea.
  17. Evgeni Gornev, SRIME, Russia.

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