2021

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2020

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• Chouprik, A., Kondratyuk, E., Mikheev, V., Matveyev, Y., Spiridonov, M., Chernikova, A., Kozodaev, M.G., Markeev, A.M., Zenkevich, A., Negrov, D. "Origin of the retention loss in ferroelectric Hf0.5Zr0.5O2-based memory devices" (2021) Acta Materialia, 204, № 116515

• Kozodaev, M.G., Slavich, A.S., Romanov, R.I., Zarubin, S.S., Markeev, A.M.  "Influence of Reducing Agent on Properties of Thin WS2Nanosheets Prepared by Sulfurization of

  Atomic Layer-Deposited WO3" (2021) Journal of Physical Chemistry C,

• Koroleva, A.A., Chernikova, A.G., Chouprik, A.A., Gornev, E.S., Slavich, A.S., Khakimov, R.R., Korostylev, E.V., Hwang, C.S., Markeev, A.M. Impact of the Atomic Layer-Deposited Ru Electrode Surface Morphology on Resistive Switching Properties of TaOx-Based Memory Structures (2020) ACS Applied Materials and Interfaces, 12 (49), pp. 55331-55341.
  
  
• Chernikova, A.G., Kozodaev, M.G., Khakimov, R.R., Polyakov, S.N., Markeev, A.M. Influence of ALD Ru bottom electrode on ferroelectric properties of Hf0.5Zr0.5O2-based capacitors (2020) Applied Physics Letters, 117 (19), статья № 192902
  
  
• Kuzmichev, D.S., Chernikova, A.G., Kozodaev, M.G., Markeev, A.M. Resistance Switching Peculiarities in Nonfilamentary Self-Rectified TiN/Ta2O5/Ta and TiN/HfO2/Ta2O5/Ta Stacks (2020) Physica Status Solidi (A) Applications and Materials Science, 217 (18), статья № 1900952,
  
  
• Romanov, R.I., Kozodaev, M.G., Lebedinskii, Y.Y., Perevalov, T.V., Slavich, A.S., Hwang, C.S., Markeev, A.M. Radical-Enhanced Atomic Layer Deposition of a Tungsten Oxide Film with the Tunable Oxygen Vacancy Concentration (2020) Journal of Physical Chemistry C, 124 (33), pp. 18156-18164
  
  
• Romanov, R.I., Slavich, A.S., Kozodaev, M.G., Myakota, D.I., Lebedinskii, Y.Y., Novikov, S.M., Markeev, A.M. Band Alignment in As-Transferred and Annealed Graphene/MoS2 Heterostructures (2020) Physica Status Solidi - Rapid Research Letters, 14 (2),  № 1900406
  
  
• Gismatulin, A., Gritsenko, V., Perevalov, T., Kuzmichev, D., Chernikova, A., Markeev, A. Charge Transport Mechanism in Atomic Layer Deposited Oxygen-Deficient TaOx Films (2020) Physica Status Solidi (B) Basic Research,

2019

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• Kozodaev M.G., Chernikova, A.G., Korostylev E.V., Park M.H., Khakimov R.R., Hwang C.S., Markeev A.M. "Mitigating wakeup effect and improving endurance of ferroelectric HfO 2 -ZrO 2 thin films by careful La-doping" Journal of Applied Physics, Volume 125, Issue 3, 21 January 2019, 034101
  
  
• R. I. Romanov, M. G. Kozodaev, D. I. Myakota, A. G. Chernikova, S. M. Novikov, V. S. Volkov, A. S. Slavich, S. S. Zarubin, P. S. Chizhov, R. R. Khakimov, A. A. Chouprik, C. S. Hwang, A. M. Markeev "Synthesis of Large Area Two-Dimensional MoS2 Films by Sulfurization of Atomic Layer Deposited MoO3Thin Film for Nanoelectronic Applications" ACS Applied Nano Materials  2019, 2, 12, 7521-75
  
  
• M. G. Kozodaev, Y. Y. Lebedinskii, A. G. Chernikova, E. V. Korostylev, A. A. Chouprik, R. R. Khakimov, Andrey M. Markeev, C. S. Hwang "Temperature controlled Ru and RuO2 growth via ${\mathbf{O}}^{*}$ radical-enhanced atomic layer deposition with Ru(EtCp)2"  J. Chem. Phys. 151, 204701 (2019)
  
  
• Vitalii Mikheev, Anastasia Chouprik, Yury Lebedinskii, Sergei Zarubin, Yury Matveyev, Ekaterina Kondratyuk, Maxim G. Kozodaev, Andrey M. Markeev, Andrei Zenkevich, Dmitrii Negrov "Ferroelectric Second-Order Memristor"  ACS Appl. Mater. Interfaces 2019, 11, 35, 32108-32114
  
  
• R. I. Romanov, D. I. Myakota, A. A. Chuprik, S. M. Novikov, Yu. Yu. Lebedinskii, A. G. Chernikova, and A. M. Markeev "Two-Dimensional and Screw Growth of MoS2 Films in the Process of Chemical Deposition from the Gas Phase" Russian Journal of Applied Chemistry Volume 92, Issue 5, 1 May 2019, Pages 596-601
  
  
• Damir R. Islamov, Vladimir A. Gritsenko, Timofey V. Perevalov, Vladimir A. Pustovarov, Oleg M. Orlov, Anna G. Chernikova, Andrey M. Markeev, Stefan Slesazeck, Uwe Schroeder, Thomas Mikolajick, Gennadiy Ya Krasnikov "Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films" , Acta Materialia Volume 166, March 2019, Pages 47-55
  
  
• Roman I. Romanov, Aleksandr S. Slavich, Maxim G. Kozodaev, Denis I. Myakota,Yuri Y. Lebedinskii, Sergey M. Novikov, and Andrey M. Markeev "Band Alignment in As-Transferred and AnnealedGraphene/MoS2Heterostructures" Physica Status Solidi - Rapid Research Letters 2019,1900406

2018

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• Maksim G. Kozodaev, Anna G. Chernikova, Roman R. Khakimov, Min Hyuk Park, Cheol Seong Hwang and Andey M. Markeev "La-doped Hf0.5Zr0.5O2 thin films for high-efficiency electrostatic supercapacitors" Applied Physics Letters, Volume 113, Issue 12, 17 September 2018, 123902

• Dmitry S. Kuzmichev, Yuri Y. Lebedinskii, Cheol Seong Hwang and Andrey M. Markeev "Atomic Layer Deposited Oxygen-Deficient TaOx Layers for Electroforming-Free and Reliable Resistance Switching Memory" Physica Status Solidi - Rapid Research Letters, 2018, 1800429

• Anna G. Chernikova, Maxim G. Kozodaev, Dmitry V. Negrov, Evgeny V. Korostylev, Min Hyuk Park , Uwe Schroeder, Cheol Seong Hwang, and Andrey M. Markeev "Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2Thin Films"  ACS Applied Materials and Interfaces, 2018, 10 (3), pp 2701–2708

• Konstantin V. Egorov,  Dmitry S. Kuzmichev, Andrey A. Sigarev,  Denis I. Myakota,  Sergey S. Zarubin,  Pavel S. Chizov,  Timofey V. Perevalov,  Vladimir A. Gritsenko, Cheol Seong Hwang  and  Andrey M. Markeev "Hydrogen radical enhanced atomic layer deposition of TaOx: saturation studies and methods for oxygen deficiency control" Journal of Materials Chemistry C, Volume 6, Issue 36, 2018, Pages 9667-9674 

2017

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• Konstantin V. Egorov, Dmitry S. Kuzmichev, Pavel S. Chizhov, Yuri Yu. Lebedinskii, Cheol Seong Hwang, and Andrey M. Markeev "In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications" ACS Applied Materials and Interfaces, 2017, 9 (15), pp 13286–13292

• Kozodaev, M.G., Lebedinskii, Y.Y., Chernikova, A.G., Polyakov, S.N., Markeev, A.M. "Low temperature plasma-enhanced ALD TiN ultrathin films for Hf0.5Zr0.5O2-based ferroelectric MIM structures" Physica Status Solidi (A) Applications and Materials Science, Volume 214, Issue 6, 1 June 2017

• Egorov, K.V., Lebedinskii, Y.Y., Soloviev, A.A., Chouprik, A.A., Azarov, A.Y., Markeev, A.M. "Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy" Applied Surface Science, Volume 419, 15 October 2017, Pages 107-113

• M. G. Kozodaev, A. G. Chernikova, E. V. Korostylev, M. H. Park, U. Schroeder, C. S. Hwang and A. M. Markeev. "Ferroelectric properties of lightly doped La:HfO2 thin films grown by plasma-assisted atomic layer deposition" Appl. Phys. Lett. 111, 132903 (2017)
  
  
• A. Chouprik, A. Chernikova, A. Markeev, V. Mikheev, D. Negrov, M. Spiridonov, S. Zarubin, A. Zenkevich. "Electron transport across ultrathin ferroelectric Hf0.5Zr0.5O2films on Si" Microelectronic Engineering 178 (2017) 250–253
  
  
• Damir R Islamov, A G Chernikova, M G Kozodaev, A M Markeev, T V Perevalov, V A Gritsenko and O M Orlov. "Leakage currents mechanism in thin films of ferroelectric Hf0.5Zr0.5O2" 2017 J. Phys.: Conf. Ser. 864 012002

2016

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1. Chernikova A.,  Kozodaev M.,  Markeev A., Negrov D., Spiridonov M.,  Zarubin S, Bak O., Buragohain P., Lu H., Suvorova E.,  Gruverman A. ,  Zenkevich A. "Ultrathin Hf0.5Zr0.5O2 Ferroelectric Films on Si" ACS Applied Materials and Interfaces Volume 8, Issue 11, 30 March 2016, Pages 7232-7237

2. Chernikova A.G., Kuzmichev D.S., Negrov D.V., Kozodaev M.G., Polyakov S.N., Markeev A.M. "Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks" Applied Physics Letters Volume 108, Issue 24, 13 June 2016

3. Orlov O.M.,Markeev A.M.,  Zenkevich A.V.,  Chernikova A.G.,  Spiridonov M.V.,  Izmaylov R.A., Gornev E.S. "Investigation of the properties and manufacturing features of nonvolatile FRAM memory based on atomic layer deposition" Russian Microelectronics Volume 45, Issue 4, 1 July 2016, Pages 262-269

4. Sergei Zarubin, , Elena Suvorova, Maksim Spiridonov, Dmitrii Negrov, Anna Chernikova, Andrey Markeev, and Andrei Zenkevich. "Fully ALD-grown TiN/Hf0.5Zr0.5O2/TiN stacks: Ferroelectric and structural properties" Applied Physics Letters Volume 109, Issue 19, 8 November 2016

2015

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1. Chernikova A.G., Markeev A.M., Lebedinskii Y.Y., Kozodaev M.G., Zablotskiy A.V. "Structural, chemical and electrical properties of ALD-grown Hf_xAl_1-xO_y thin films for MIM capacitors" Physica Status Solidi (B) Basic Research Volume 252, Issue 4, 1 April 2015, Pages 701-708

2. Egorov, K.V., Lebedinskii, Y.Y., Markeev, A.M., Orlov, O.M. "Full ALD Ta2O5-based stacks for resistive random access memory grown with in vacuo XPS monitoring" Applied Surface Science Volume 356, 30 November 2015, Pages 454-459

3. Lebedinskii Y.Y, Chernikova A.G, Markeev A.M., Kuzmichev D.S. "Effect of dielectric stoichiometry and interface chemical state on band alignment between tantalum oxide and platinum" Applied Physics Letters Volume 107, Issue 14, 5 October 2015, Article number 142904

4. Matveyev Y., Egorov K., Markeev A., Zenkevich A. "Resistive switching and synaptic properties of fully atomic layer deposition grown TiN/HfO2/TiN devices" Journal of Applied Physics Volume 117, Issue 4, 28 January 2015, Article number 044901

5. Egorov, K.V. , Kirtaev, R.V.,  Lebedinskii, Y.Y.,  Markeev, A.M.,  Matveyev, Y.A., Orlov, O.M.,  Zablotskiy, A.V.,  Zenkevich, A.V.  "Complementary and bipolar regimes of resistive switching in TiN/HfO2/TiN stacks grown by atomic-layer deposition" Physica Status Solidi (A) Applications and Materials Science Volume 212, Issue 4, 1 April 2015, Pages 809-816

6. Chernikova A.,  Kozodaev M.,  Markeev A.,  Matveev Y.,  Negrov D.,  Orlov O.,  "Confinement-free annealing induced ferroelectricity in Hf0.5Zr0.5O2 thin films" Microelectronic Engineering Volume 147, 1 November 2015, Pages 15-18

7. Islamov D.R., Chernikova A.G.,  Kozodaev M.G.,  Markeev A.M.,  Perevalov T.V.,  Gritsenko V.A.,  Orlov O.M., "Charge transport mechanism in thin films of amorphous and ferroelectric Hf0.5Zr0.5O2" JETP Letters Volume 102, Issue 8, 1 October 2015, Pages 544-547

2014

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1. Matveyev Yu.A., Markeev A.M., Lebedinskii Yu.Yu., Chouprik A.A., Egorov K.V., Drube W., Zenkevich A.V., "Resistive switching effect in Hf_xAl_1-xO_y with a graded Al depth profile studied by hard X-ray photoelectron spectroscopy" Thin Solid Films Volume 563, 31 July 2014, Pages 20-23

2013

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1. A.Markeev, A.Chouprik, K.Egorov, Yu.Lebedinskii, A.Zenkevich and O.Orlov. "Multilevel resistive switching in ternary HfxAl1-xOy oxide with graded Al depth profile". Microelectronic Engineering, 2013.

2. Andrey M.Markeev, Anna G.Chernikova, Anastasya A.Chouprik, Sergey A.Zaitsev, Dmitry V.Ovchinnikov, Holger Althues, and Susanne Dorfler. "Atomic layer deposition of Al2O3 and AlxTi1-xOy thin films on N2O plasma pretreated carbon materials". J. Vac. Sci. Technol. A 31, 01A135 (2013).

 

 2012

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1. Alekhin A.P., Chouprik A.A., Grigal I.P., Gudkova S.A., Lebedinskii Yu.Yu., Markeev A.M., Zaitsev S.A. "Electrical properties of quaternary HfAlTiO thin films grown by atomic layer deposition". Thin Solid Films 520 (14), 2012, pp.4547-4550.

2. Grigal I.P., Markeev A.M., Gudkova S.A., Chernikova A.G., Mityaev A.S., Alekhin A.P. "Correlation between bioactivity and structural properties of titanium dioxide coatings grown by atomic layer deposition". Applied Surface Science 258 (8), 2012, pp.3415-3419.

 

2011

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1. Grigal I.P., Alekhin A.P., Markeev A.M., Gudkova S.A., Chernikova A.G., TetyukhinD.V., Kozlov E.N. "Atomic layer deposition of bioactive TiO2 coatings for titanium implants".European Cells and Materials 22 (SUPPL.1), 2011, pp.27.

 

2010

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1. Alekhin A.P., Lapushkin G.I., Markeev A.M., Sigarev A.A., Toknova V.F. "Atomic layer deposition of the titanium dioxide thin film from tetraethoxytitanium and water".Journal of Surface Investigation 4 (3), 2010, pp.379-383.

2. Alekhin A.P., Gudkova S.A., Markeev A.M., Mitiaev A.S., Sigarev A.A., Toknova V.F. "Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles". Applied Surface Science 257 (1), 2010, pp.186-191.

3. Alekhin A.P., Boleiko G.M., Gudkova S.A., Markeev A.M., Sigarev A.A., Toknova V.F., Kirilenko A.G., Lapshin R.V., Kozlov E.N., Tetyukhin D.V. "Synthesis of biocompatible surfaces by nanotechnology methods". Nanotechnologies in Russia ,Volume 5, Issue 9-10, 2010, pages 696-708.

4. Alekhin A.P., Gudkova S.A., MarkeevA.M., Mitiaev A.S., Sigarev A.A., Toknova V.F. "Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles". Applied Surface Science 257 (1), 2010, pp.186-191