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Konstantin V. Egorov, Dmitry S. Kuzmichev, Pavel S. Chizhov, Yuri Yu. Lebedinskii, Cheol Seong Hwang, and Andrey M. Markeev "In Situ Control of Oxygen Vacancies in TaOx Thin Films via Plasma-Enhanced Atomic Layer Deposition for Resistive Switching Memory Applications" ACS Applied Materials and Interfaces, 2017, 9 (15), pp 13286–13292
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Kozodaev, M.G., Lebedinskii, Y.Y., Chernikova, A.G., Polyakov, S.N., Markeev, A.M. "Low temperature plasma-enhanced ALD TiN ultrathin films for Hf0.5Zr0.5O2-based ferroelectric MIM structures" Physica Status Solidi (A) Applications and Materials Science, Volume 214, Issue 6, 1 June 2017
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Egorov, K.V., Lebedinskii, Y.Y., Soloviev, A.A., Chouprik, A.A., Azarov, A.Y., Markeev, A.M. "Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy" Applied Surface Science, Volume 419, 15 October 2017, Pages 107-113
- " Appl. Phys. Lett. 111, 132903 (2017)
- A. Chouprik, A. Chernikova, A. Markeev, V. Mikheev, D. Negrov, M. Spiridonov, S. Zarubin, A. Zenkevich. "Electron transport across ultrathin ferroelectric Hf0.5Zr0.5O2films on Si" Microelectronic Engineering 178 (2017) 250–253
- Damir R Islamov, A G Chernikova, M G Kozodaev, A M Markeev, T V Perevalov, V A Gritsenko and O M Orlov. "Leakage currents mechanism in thin films of ferroelectric Hf0.5Zr0.5O2" 2017 J. Phys.: Conf. Ser. 864 012002
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